Via First Plus Via Last Technique for IC Interconnect

ABSTRACT

A multi-tiered IC device contains a first die including a substrate with a first and second set of vias. The first set of vias extends from one side of the substrate, and the second set of vias extend from an opposite side of the substrate. Both sets of vias are coupled together. The first set of vias are physically smaller than the second set of vias. The first set of vias are produced prior to circuitry on the die, and the second set of vias are produced after circuitry on the die. A second die having a set of interconnects is stacked relative to the first die in which the interconnects couple to the first set of vias.

CROSS REFERENCE TO RELATED APPLICATION

This application is a divisional of U.S. patent application Ser. No.12/334,433 entitled “Via First Plus Via Last Technique for ICInterconnect” to KASKOUN et al., filed on Dec. 12, 2008.

TECHNICAL FIELD

This disclosure generally relates to integrated circuits (ICs). Morespecifically, this disclosure relates to multi-tiered IC devices andeven more specifically to designs and methods for interconnecting dies.

BACKGROUND

IC technology is continuously driven by a demand for higher performancechips. One limiting factor is timing delays resulting from longinterconnects in 2-D structures. As a result, IC technology isprogressing towards multi-tiered (3-D) IC devices (also referred to asmulti-layered IC devices or stacked IC devices). In multi-tiered ICdevices short vertical interconnects (also known as through-silicon viasor TSVs) replace problematic longer horizontal interconnects in 2-Dstructures. Two methods for creating the TSVs are via first and vialast.

The via first method involves forming the TSVs in a substrate before anyother fabrication of circuitry occurs. A pattern of vias is etched ordrilled into a fraction of the depth of the base substrate. The vias arethen filled with an insulating layer and conducting material, andcircuit fabrication follows. One or more dies can then bond to the TSVs.The back side of the substrate containing the TSVs is ground down toexpose the TSVs. Metallization of the exposed TSVs enables packaging ofthe multi-tiered structure.

In the via last method, circuitry fabrication takes place before theTSVs are formed. The circuitry contains interconnect pads that will becoupling points for the TSVs. TSVs are created by either etching ordrilling into the pad through the depth of the substrate or etching ordrilling from the back side of the substrate to the pad. The TSV is thenfilled with an insulating barrier and conducting material. The back ofthe substrate is metallized to enable packaging of the multi-tieredstructure.

Both techniques enable building of multi-tiered structures and havespecific advantages. However, each technique has undesired limitations.The via first method utilizes semiconductor fabrication processes,allowing for small vias and a resulting high packing density (ratio ofsurface area containing vias to the total surface area). This via firstprocess fabricates vias having a limited aspect ratio (ratio of depth ofTSV to diameter of TSV) which limits the depth of the TSV to less thanthe thickness of the substrate. As a result, grinding the substrate toexpose the TSV reduces the substrate thickness and leads tounpredictable responses from circuitry built on the substrate. The vialast method utilizes processes for forming the TSV that result in largerdiameters and lower density of TSVs. The larger diameters allow thedepth of the TSV to extend the entire thickness of the substrate.

It would be preferable in some situations to have TSVs of high packingdensity (as in the via first method) that also extend the entire depthof the substrate (as in the via last method).

BRIEF SUMMARY

In accordance with one aspect of the disclosure, a process formanufacturing a multi-tiered integrated circuit device includesproviding a first die with a substrate having a first side and a secondside facing away from the first side. The process also includesmanufacturing a first set of vias extending into the substrate from thefirst side of the substrate prior to manufacturing circuitry on thefirst die. The process further includes manufacturing a second set ofvias extending into the substrate from the second side of the substrateafter manufacturing circuitry on the first die.

This has outlined, rather broadly, the features and technical advantagesof the present invention in order that the detailed description thatfollows may be better understood. Additional features and advantages ofthe invention will be described below. It should be appreciated by thoseskilled in the art that this disclosure may be readily utilized as abasis for modifying or designing other structures for carrying out thesame purposes of the present invention. It should also be realized bythose skilled in the art that such equivalent constructions do notdepart from the teachings of the invention as set forth in the appendedclaims. The novel features, which are believed to be characteristic ofthe invention, both as to its organization and method of operation,together with further objects and advantages, will be better understoodfrom the following description when considered in connection with theaccompanying figures. It is to be expressly understood, however, thateach of the figures is provided for the purpose of illustration anddescription only and is not intended as a definition of the limits ofthe present invention.

BRIEF DESCRIPTION OF THE DRAWINGS

For a more complete understanding of the disclosure in the presentapplication, reference is now made to the following descriptions takenin conjunction with the accompanying drawings, in which:

FIG. 1 is a schematic drawing of a multi-tiered IC device having twosets of vias, one of which is manufactured by via first, and the otheris manufactured by via last.

FIG. 2 is a schematic drawing of the first die after the first set ofvias are manufactured.

FIG. 3 is a schematic drawing of the first die after the second set ofvias are manufactured.

FIG. 4 is a schematic drawing of the first die after a conformalinsulator layer is deposited.

FIG. 5 is a schematic drawing after the insulating layer is etched toexpose contact points for the first set of vias to the second set ofvias.

FIG. 6 is a schematic drawing after the conducting material is depositedin the second set of vias.

FIG. 7 shows an exemplary wireless communication system in which anembodiment of the invention may be advantageously employed.

DETAILED DESCRIPTION

FIG. 1 is a schematic drawing of a multi-tiered IC device 10 having afirst die 11 and a second die 12. The first die 11 includes a substratelayer 113 and a circuitry layer 114. The substrate layer 113 includes afirst set of vias 111 and a second set of vias 112. The first set ofvias 111 are coupled to the second set of vias 112. The first set ofvias 111 are also coupled to interconnects 115. The second die 12includes a substrate layer 121 and a circuitry layer 122 coupled tointerconnects 123. The interconnects 123 couple to the first set of vias111. For illustrative purposes, the location 13 contains a single viafrom the first set of vias 111 coupled to a single via from the secondset of vias 112. An alternate embodiment is illustrated in the location14 where multiple vias from the first set of vias 111 couple to a singlevia from the second set of vias 112.

In one embodiment, multiple vias in the first set of vias 111 arecoupled to a single via in the second set of vias 112 (as illustrated inthe location 14) when multiple vias of the first set carry the samesignal. For example, the first set of vias 111 may carry supply voltagefor the circuitry layer 122 on the second die 12.

In another embodiment, a single via in the first set of vias 111 iscoupled to a single via in the second set of vias 112 (as illustrated inthe location 13) when vias in the first set of vias 111 carryindependent signals.

The first set of vias 111 are produced through via first processing andin one embodiment have diameters between 0.1-10 microns. The second setof vias 112 are produced through via last processing and in oneembodiment have diameters between 11-100 microns.

Although FIG. 1 and the above description only discuss two dies coupledtogether, one skilled in the art will recognize that additional dies maybe further stacked on the multi-tiered integrated circuit device to forma larger structure. A variable number of dies may be stacked bycontinuing to form TSVs through the dies.

FIGS. 2 through 6 show an exemplary method of manufacturing amulti-tiered IC device having two sets of vias, one of which ismanufactured by the via first process, and the second is manufactured bythe via last process.

FIG. 2 shows the substrate layer 113 having a front side 210 and a backside 220. A first set of vias 211 have been formed on the front side210. The first set of vias 211 includes a conducting material 212 and aninsulating material 213. The insulating material 213 electricallyisolates vias in the second set of vias 221 from the substrate 113. Inone embodiment, the first set of vias 211 have diameters ranging between1-10 microns.

FIG. 3 shows the substrate layer 113 with the first set of vias 211 onthe front side 210. For illustrative purposes, the substrate layer 113has been rotated 180 degrees. After active circuitry (not shown) hasbeen fabricated, the second set of vias 221 are manufactured. In thedepicted embodiment, the second set of vias have tapering walls. Thetapering facilitates processes discussed below, namely electricalisolation of the second set of vias 221 from the substrate 113. In oneembodiment, the second set of vias 221 have diameters ranging between50-100 microns. The tapered walls of the second set of vias 221 can beachieved by dry or wet etch.

Tapering the walls of the second set of vias 221 facilitates the nextprocess involving electrically isolating the second set of vias 221 fromthe substrate layer 113 while coupling the second set of vias 221 withthe first set of vias 211. Depositing conformal coatings on non-taperedwalls is a difficult process because the wall is shadowed from aconventional deposition source. Additionally, the insulating layer thatdeposits on the exposed first set of vias 211 must be etched awaywithout completely etching the deposited insulator on the walls of thesecond set of vias 221. Tapering the walls of the via facilitates theelectrical isolation of the second set of vias 221 from the substratelayer 113 and facilitates the electrical coupling of the second set ofvias 221 to the first set of vias 211.

FIG. 4 shows the substrate layer 113 with the first set of vias 211 andthe second set of vias 221. Conformal deposition creates an insulatorlayer 222. The insulation layer 222 covers all areas with equalthickness on the backside 220 of the substrate 113. One technique forproducing a conformal coating of the insulator layer 222 is physicalvapor deposition (PVD).

As described earlier, tapering of the walls of the second set of vias221 facilitates the coupling of the first set of vias 211 to the secondset of vias 221. This is done by completely removing the insulatinglayer 222 from the first set of vias 211 without completely removing theinsulating layer 222 from the walls of the second set of vias 221. Inone embodiment, etching is used to remove the insulating layer 222.

FIG. 5 shows the substrate layer 113 with the first set of vias 211 andthe second set of vias 221. In one embodiment, etching with reactive ionetching exposes different thicknesses for the tapered regions andnon-tapered regions of the insulator layer 222 to impinging ions with atrajectory orthogonal to the substrate layer 113. The thickness of theinsulator 222 on the tapered walls of the second set of vias 221 seen byimpinging ions is the deposition thickness increased by a factor of thecosine of the angle of tapering. Complete etching of the insulator layer222 from non-tapered regions in the backside of the substrate 220 and asubstantially parallel side of the first vias is illustrated in thelocations 21 and 22, respectively. Etching also thins the insulatorlayer 222 in tapered regions of the second set of vias 221. The location22 illustrates a coupling point for the first set of vias 211 to thesecond set of vias 221. Remaining areas of the insulating layer 222electrically isolate the second set of vias 221 from the substrate 113.

FIG. 6 shows a conducting material 601 deposited in the second set ofvias 221. The conducting material may be, for example, copper or carbonnanotubes or a combination of the copper and carbon nanotubes. Thelocation 22 illustrates coupling between the first set of vias 211 andthe second set of vias 221.

One advantage of this disclosure is the ability to have low packingdensity of vias on one side of the die coupling to a high packingdensity of interconnects on the other side of the die. Memory devicesconventionally use a high packing density of interconnects with respectto microprocessors. However, massive parallelization of theinterconnects on memory devices can be accomplished because many of theinterconnects share common signals, i.e. ground and supply voltage. As aresult, not all of the interconnects require an individual connection tothe outside world. Therefore, a high density of interconnects on a diecan be accommodated by a low density of vias to a packaging substrate.One such case is a multi-tiered IC device in which the active layer 122on the second die 12 contains memory circuitry. In such a case theactive layer 114 on the first die 11 can be a microprocessor or otherlogic circuitry.

A further advantage is achieving better grounding through the vias dueto the increased conductance of the larger diameter of the second set ofvias. The larger diameter also allows for higher current densitiesthrough the vias reducing resistance. An additional result of the lowerresistance is a reduction of heat generation by Joule heating. Lowerheat generation levels allow denser circuitry to be fabricated. Finally,this structure retains the advantages of both via first processing andvia last processing. Specifically, less surface area is reserved for thevia on the active side of the substrate, allowing more circuitry to bebuilt, and the substrate does not need to be reduced in thickness,leading to better performing transistors.

A further embodiment of this disclosure could stack the second die 12 onthe first die 11 such that the interconnects 123 couple to the secondset of vias 112.

Coupling as set forth in this document refers to any method available totransmit signals from one location to a second location either directlyor indirectly. The signals are unaltered and unprocessed betweencoupling points. This can include electrical, optical, or other methods.

FIG. 7 shows an exemplary wireless communication system 700 in which anembodiment of the invention may be advantageously employed. For purposesof illustration, FIG. 7 shows three remote units 720, 730, and 750 andtwo base stations 740. It will be recognized that typical wirelesscommunication systems may have many more remote units and base stations.Remote units 720, 730, and 750 include multi-tiered IC devices 725A,725B and 725C, created according to an embodiment of the invention. FIG.7 shows forward link signals 780 from the base stations 740 and theremote units 720, 730, and 750 and reverse link signals 790 from theremote units 720, 730, and 750 to base stations 740.

In FIG. 7, remote unit 720 is shown as a mobile telephone, remote unit730 is shown as a portable computer, and remote unit 750 is shown as afixed location remote unit in a wireless local loop system. For example,the remote units may be cell phones, hand-held personal communicationsystems (PCS) units, portable data units such as personal dataassistants, or fixed location data units such as meter readingequipment. Although FIG. 7 illustrates remote units according to theteachings of the invention, the invention is not limited to theseexemplary illustrated units. The invention may be suitably employed inany device which includes multi-tiered IC devices fabricated inaccordance with the teachings of the disclosure.

Although the present invention and its advantages have been described indetail, it should be understood that various changes, substitutions andalterations can be made herein without departing from the spirit andscope of the invention as defined by the appended claims. Moreover, thescope of the present application is not intended to be limited to theparticular embodiments of the process, machine, manufacture, compositionof matter, means, methods and steps described in the specification. Asone of ordinary skill in the art will readily appreciate from thedisclosure of the present invention, processes, machines, manufacture,compositions of matter, means, methods, or steps, presently existing orlater to be developed that perform substantially the same function orachieve substantially the same result as the corresponding embodimentsdescribed herein may be utilized according to the present invention.Accordingly, the appended claims are intended to include within theirscope such processes, machines, manufacture, compositions of matter,means, methods, or steps.

1. A process for manufacturing a multi-tiered integrated circuit device,comprising: providing a first die with a substrate having a first sideand a second side facing away from the first side; manufacturing a firstset of vias extending into the substrate from the first side of thesubstrate prior to manufacturing circuitry on the first die; andmanufacturing a second set of vias extending into the substrate from thesecond side of the substrate after manufacturing circuitry on the firstdie.
 2. The process of claim 1, in which manufacturing the second set ofvias comprises manufacturing the second set of vias extending into thesecond side of the substrate to expose at least one via of the first setof vias.
 3. The process of claim 2, further comprising electricallyconnecting at least one via of the first set of vias with at least onevia of the second set of vias.
 4. The process of claim 1, in whichmanufacturing the second set of vias comprises manufacturing the secondset of vias with tapered walls with a dry etch.
 5. The process of claim4, in which manufacturing the second set of vias further comprises:depositing a conformal layer of an insulating material on the secondside of the first die, the tapered walls of the second set of vias, andsurfaces of the first set of vias, which are substantially parallel tothe second side; etching the insulating material whereby the insulatingmaterial is removed from the second side of the first die and from asurface of the first set of vias which is substantially parallel to thesecond side; and filling the second set of vias with conducting materialcoupled to exposed conducting material of the first set of vias.
 6. Theprocess of claim 5, in which filling the second set of vias comprisesfilling the second set of vias with at least one of copper and carbonnanotubes.
 7. The process of claim 5, in which depositing the conformallayer of the insulating material comprises physical vapor deposition ofthe insulating material.
 8. The process of claim 5, in which etching theinsulating material comprises reactive ion etching of the insulatingmaterial.
 9. The process of claim 1, further comprising electricallyconnecting at least two vias of the first set of vias with at least onevia of the second set of vias.
 10. The process of claim 9, furthercomprising coupling at least one of a ground and a supply voltage to thesecond set of vias.
 11. The process of claim 1, further comprisingstacking a second die relative to the first die.
 12. The process ofclaim 11, in which stacking the second die relative to the first diecomprises stacking a microprocessor die relative to a memory die. 13.The process of claim 11, further comprising coupling at least oneinterconnect of the second die to at least one via of the first set ofvias of the first die.
 14. The process of claim 1, in whichmanufacturing the second set of vias comprises manufacturing vias with alarger diameter than the first set of vias.
 15. The process of claim 1,further comprising integrating the multi-tiered integrated circuitdevice into at least one of a cell phone, a hand-held personalcommunication systems (PCS) unit, a portable data unit, a personal dataassistant, and a fixed location data unit.